APCVD System
Low cost in-line deposition of thin films
Product Line
1500 Series
Fast Response Conveyor Furnace
2500 Series
Controlled Atmosphere Conveyor Furnace
3500 Series
Solder Reflow and Packaging Furnace
4500 Series
Curing and Drying Oven
5500 Series
APCVD System
7500 Series
Infrared Lamp Furnace
8500 Series
Elevator Batch Oven
9500 Series
Advanced Innovation
The Atmospheric Pressure Chemical Vapor Deposition System is well suited for continuous low-cost high -volume processing of substrates requiring single as well as multi-layer thin films. SierraThermal’s in-line system design assures that each substrate receives the same process treatment. The energy efficient precision film deposition provides unequaled economic performance.
Low cost in-line deposition of thin films
The production proven APCVD System from SierraThermal includes multiple injector heads in series to maximize process throughput, uniformity, and flexibility while minimizing cost. The world class HMI allows the customer to easily monitor and control all process parameters in a user-friendly touchscreen environment.
The maintenance-conscious design allows chemical injectors and exhaust ducting to be cleaned while in place on the system and without significant process interruption. Modular chemical vapor injector head assemblies allow quick and easy installation and removal from the coating chamber. All injector head parts are durable precision machined structures ensuring accurate chemical delivery even after extended use.
The SierraThermal APCVD System offers the lowest cost alternative for film deposition. In the roller transport system, only the substrate is heated during the process, so electricity and cooling requirements are greatly reduced. Multiple injector heads can be used in series within a single APCVD system. Three tiers of graded, power saving insulation further reduce energy bills. The in-line system is available in two configurations: with belt transport or with roller transport. Each transport method has its advantages.
Thermal Systems from SierraThermal have become famous for process stability, and the Atmospheric Pressure Chemical Vapor Deposition system continues this tradition. Stable, unsurpassed temperature uniformity control ensures consistent process results. In addition, precision process exhaust and precursor flow controls guarantee consistent film results.
Applications:
High throughput in-line deposition processes
Multi-layer in-line coating
Boron doping
Phosphorous doping
Conductive films
a-Si deposition
TiO2 deposition
Perovskite related films
Benefits:
Excellent for boron doping of n-type solar cells
Low cost of ownership resulting from low facilities requirements
Maintenance conscious design allows interior access with the push of a button
Small footprint
Proven in mass production
World class HMI with built in profiling, data and event logging, and touchscreen interface
Technical Data:
Dimensions (LxWxH):
3.3 x 1.9 x 2.3 m (roller transport)
Films Deposited:
Undoped SiO2 (USG)
Boron doped SiO2 (BSG)
Phosphorous doped SiO2 (PSG)
TiO2
Deposition Chamber Configuration:
Roller Transport: Two independent deposition chambers
Belt Transport: 3 or 5 independent deposition chambers
Each chamber can be used to deposit any available film
Loading:
Roller Transport: 5 lanes of 156 – 161.7mm c-Si wafers transported on ceramic rollers
Belt Transport: 4 lanes of 156-161.7mm c-Si wafers transports on a mesh belt
Other substrates possible
Throughput:
1450 – 4500 wafers/h (depending on film thickness)